•  On Nov, 04, 2012
•  DST

After understanding the surface contaminant and detergent selection, now is the time for us to set up a wet surface cleaning process.  CMP process for wafer and hard disc substrate is one of the highly demanding processes and the subsequence surface cleaning process does play an important role in overall yield.  The wet surface cleaning […]

•  On Oct, 02, 2012
•  DST

Surface cleaning is becoming more critical and stringent in many industries cleaning process, this include wafer surface cleaning process and hard disc drive surface cleaning.  The main objective of surface cleaning is removing small particulate and left over on the substrate surface.  The particulate mainly come from previous process such as abrasive and sludge. Field […]